Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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=== SEM inspection === | === SEM inspection === | ||
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! colspan="7" width=85% | SEM inspection of wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm | |||
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! 300 [muC/cm2] | |||
| [[File:6_13_100nm_300_shot14.png|200px]] | |||
| [[File:6_13_100nm_300_shot14_Lines.png|200px]] | |||
| [[File:6_13_100nm_300_shot14_Holes.png|200px]] | |||
| [[File:6_13_100nm_300_shot14_Holes2.png|200px]] | |||
| [[File:6_13_100nm_300_shot14_Pillars.png|200px]] | |||
| [[File:6_13_100nm_300_shot14_Test.png|200px]] | |||
! ACHK NOT READY | |||
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