Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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== Spin Curves == | == Spin Curves == | ||
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Please be aware that I have experienced a somewhat large thickness deviation (5-8 %) depending on the amount of resist applied to the wafer before spin coating. | Please be aware that I have experienced a somewhat large thickness deviation (5-8 %) depending on the amount of resist applied to the wafer before spin coating. | ||
<span style="color:#696969">'''Dosepattern has been e-beam exposured and SEM inspected on those wafers marked by silver gray.'''</span> | <span style="color:#696969">'''Dosepattern has been e-beam exposured and SEM inspected on those wafers marked by silver gray.'''</span> | ||
[[File:SpinCurveCSAR.jpg|right|600px]] | |||