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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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DCH-Employees-701
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DCH-Employees-701
2,257 edits
Line 455: Line 455:
|-  
|-  
! 300 [muC/cm2]
! 300 [muC/cm2]
| [[File:6_13_50nm_300_shot14.png|230px]]
| [[File:6_13_50nm_300_shot14.png|200px]]
| [[File:6_13_50nm_300_shot14_Lines.png|230px]]
| [[File:6_13_50nm_300_shot14_Lines.png|200px]]
| [[File:6_13_50nm_300_shot14_Holes.png|230px]]  
| [[File:6_13_50nm_300_shot14_Holes.png|200px]]  
| [[File:6_13_50nm_300_shot14_Pillars.png|230px]]
| [[File:6_13_50nm_300_shot14_Pillars.png|200px]]
| [[File:6_13_50nm_300_shot14_Holes2.png|230px]]
| [[File:6_13_50nm_300_shot14_Holes2.png|200px]]
! ACHK NOT READY  
! ACHK NOT READY  
|-
|-
Line 469: Line 469:
|-
|-
! 240 [muC/cm2]
! 240 [muC/cm2]
| [[File:6_13_30nm_240_shot14.png|230px]]
| [[File:6_13_30nm_240_shot14.png|200px]]
| [[File:6_13_30nm_240_shot14_Lines.png|230px]]
| [[File:6_13_30nm_240_shot14_Lines.png|200px]]
|
|
|
|
Line 477: Line 477:
|-  
|-  
! 270 [muC/cm2]
! 270 [muC/cm2]
| [[File:6_13_30nm_270_shot14.png|230px]]
| [[File:6_13_30nm_270_shot14.png|200px]]
| [[File:6_13_30nm_270_shot14_Lines.png|230px]]
| [[File:6_13_30nm_270_shot14_Lines.png|200px]]
| [[File:6_13_30nm_270_shot14_Holes.png|230px]]
| [[File:6_13_30nm_270_shot14_Holes.png|200px]]
| [[File:6_13_30nm_270_shot14_Pillars.png|230px]]
| [[File:6_13_30nm_270_shot14_Pillars.png|200px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-  
|-  
|-  
|-  
! 300 [muC/cm2]
! 300 [muC/cm2]
| [[File:6_13_30nm_300_shot14.png|230px]]
| [[File:6_13_30nm_300_shot14.png|200px]]
| [[File:6_13_30nm_300_shot14_Lines.png|230px]]
| [[File:6_13_30nm_300_shot14_Lines.png|200px]]
| [[File:6_13_30nm_300_shot14_Holes.png|230px]]
| [[File:6_13_30nm_300_shot14_Holes.png|200px]]
| [[File:6_13_30nm_300_shot14_Pillars.png|230px]]
| [[File:6_13_30nm_300_shot14_Pillars.png|200px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-
|-
Line 499: Line 499:
|-  
|-  
! 270 [muC/cm2]
! 270 [muC/cm2]
| [[File:6_13_20nm_270_shot14.png|230px]]
| [[File:6_13_20nm_270_shot14.png|200px]]
| [[File:6_13_20nm_270_shot14_Lines.png|230px]]
| [[File:6_13_20nm_270_shot14_Lines.png|200px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-  
|-  
|-  
|-  
! 300 [muC/cm2]
! 300 [muC/cm2]
| [[File:6_13_20nm_300_shot14.png|230px]]
| [[File:6_13_20nm_300_shot14.png|200px]]
| [[File:6_13_20nm_300_shot14_Lines.png|230px]]
| [[File:6_13_20nm_300_shot14_Lines.png|200px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/CSAR"