Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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=== SEM inspection === | === SEM inspection === | ||
{| class="wikitable collapsible | {| class="wikitable collapsible collapsed" style="border: 5px solid black;" style="width: 90%;" align="center" | ||
!colspan="8"| SEM inspection of wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm | !colspan="8"| SEM inspection of wafer 6.13, 100 nm exposed pattern, shot pitch 7 nm | ||
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! 300 [muC/cm2] | ! 300 [muC/cm2] | ||
| [[File:6_13_100nm_300_shot14.png| | | [[File:6_13_100nm_300_shot14.png|200px]] | ||
| [[File:6_13_100nm_300_shot14_Lines.png| | | [[File:6_13_100nm_300_shot14_Lines.png|200px]] | ||
| [[File:6_13_100nm_300_shot14_Holes.png| | | [[File:6_13_100nm_300_shot14_Holes.png|200px]] | ||
| [[File:6_13_100nm_300_shot14_Holes2.png| | | [[File:6_13_100nm_300_shot14_Holes2.png|200px]] | ||
| [[File:6_13_100nm_300_shot14_Pillars.png| | | [[File:6_13_100nm_300_shot14_Pillars.png|200px]] | ||
| [[File:6_13_100nm_300_shot14_Test.png| | | [[File:6_13_100nm_300_shot14_Test.png|200px]] | ||
! ACHK NOT READY | ! ACHK NOT READY | ||
|- | |- | ||