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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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|Duration
|Duration
|2.5 s
|2.5 s
|rowspan="16" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe 'nano1.42'
[[File:617817 HD-4_11.png|200px]] [[File:617817 HD-4_18.png|200px]]
[[File:617817 HD-4_16.png|200px]] [[File:617817 HD-4_14.png|200px]]
|-
|-
| width ="30"| Gasses
| width ="30"| Gasses
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