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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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Line 856: Line 856:
|400 W Coil, 20 W Platen
|400 W Coil, 20 W Platen
|-
|-
 
   
 
 
 
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched minutes  with recipe ''
 
|-
| Pressure
|  mTorr,
Strike:  secs @  mTorr
 
|-
| Power
|  W Coil Power, W Platen Power
 
|-
|Platen temperature
|Platen temperature
| °C
|20 °C
|-
|-


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