Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 774: | Line 774: | ||
| Gasses | | Gasses | ||
| C<sub>4</sub>F<sub>8</sub> sccm, SF<sub>6</sub> sccm | | C<sub>4</sub>F<sub>8</sub> sccm, SF<sub>6</sub> sccm | ||
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched | |rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 60s with recipe 'ProcessC' | ||
[[File:tigre 6.17 0% 3b_ 11.png|200px]] [[File:tigre 6.17 0% 3b_ 14.png|200px]] [[File:tigre 6.17 0% 3b_ 16.png|200px]] [[File:tigre 6.17 0% 3b_ 07.png|200px]] | [[File:tigre 6.17 0% 3b_ 11.png|200px]] [[File:tigre 6.17 0% 3b_ 14.png|200px]] [[File:tigre 6.17 0% 3b_ 16.png|200px]] [[File:tigre 6.17 0% 3b_ 07.png|200px]] | ||
| Line 804: | Line 804: | ||
|- | |- | ||
|CSAR | |CSAR | ||
| | | 158 nm/min | ||
|- | |- | ||
|} | |} | ||