Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 728: | Line 728: | ||
| Gasses | | Gasses | ||
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | ||
|rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2 | |rowspan="7" width="20%" | Profiles of lines exposed at 300 µC/cm2, etched 2:30 minutes (150s) with recipe 'nano1.42' | ||
[[File:617817 HD-4_11.png|200px]] [[File:617817 HD-4_18.png|200px]] | [[File:617817 HD-4_11.png|200px]] [[File:617817 HD-4_18.png|200px]] | ||
[[File:617817 HD-4_16.png|200px]] [[File:617817 HD-4_14.png|200px]] | [[File:617817 HD-4_16.png|200px]] [[File:617817 HD-4_14.png|200px]] | ||