Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 755: | Line 755: | ||
| 500 nm lines: ~500 nm/min | | 500 nm lines: ~500 nm/min | ||
190 nm lines: ~500 nm/min | 190 nm lines: ~500 nm/min | ||
102 nm lines: ~490 nm/min | 102 nm lines: ~490 nm/min | ||
61 nm lines: ~440 nm/min | 61 nm lines: ~440 nm/min | ||
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