Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 752: | Line 752: | ||
! rowspan="2" align="center"| Etch rates | ! rowspan="2" align="center"| Etch rates | ||
| Si | | Si | ||
| | | 500 nm lines: ~500 nm/min | ||
190 nm lines: ~500 nm/min | |||
102 nm lines: ~490 nm/min | |||
61 nm lines: ~440 nm/min | |||
|- | |- | ||
|CSAR | |CSAR | ||
| | | ~55 nm/min | ||
|- | |- | ||
|} | |} | ||