Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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==== Continous Etches ==== | ==== Continous Etches ==== | ||
[[File:617817 HD-4_11.tif|300px]] | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" style="width: 60%;" | ||
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| Gasses | | Gasses | ||
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | ||
|rowspan="7" | | |rowspan="7" | [[File:617817 HD-4_14.tif|300px]] [[File:617817 HD-4_16.tif|300px]] [[File:617817 HD-4_18.tif|300px]] | ||
|- | |- | ||
| Pressure | | Pressure | ||