Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 339: | Line 339: | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| | |CSAR AR-P6200 AllResist | ||
|4000 | |19-12-2014, LabSpin A-1, 4000 rpm, 60s, softbaked 60s @ 150degC | ||
| | |19-12-2014, JBX9500 E-2, 2nA aperture 5, doses 60-600 µC/cm2 | ||
| | |22-12-2014, 05-01-2015, Fumehood D-2, misc developers, rinsed in IPA 60s | ||
|23-12-2014, 05-01-2015, Zeiss Supra 60VP, 10kV, Inlens detector, stage at ~-5 degrees | |||
|- | |- | ||