Specific Process Knowledge/Lithography/Coaters: Difference between revisions
| Line 214: | Line 214: | ||
You need to create the separated recipe for each station an then collect the recipes in a flow. For video station we have 3 standard recipes for 3 different wafer sizes: 2inch, 4inch, 6inch. To create a recipe for coater station you need to describe spinning sequence using the predefined functions. Then you create recipe for hotplates after all recipes are created they can be set together in the different flows. It is why we are not recommending the user just change some parameters in the recipe, this change can effect some other flows. | You need to create the separated recipe for each station an then collect the recipes in a flow. For video station we have 3 standard recipes for 3 different wafer sizes: 2inch, 4inch, 6inch. To create a recipe for coater station you need to describe spinning sequence using the predefined functions. Then you create recipe for hotplates after all recipes are created they can be set together in the different flows. It is why we are not recommending the user just change some parameters in the recipe, this change can effect some other flows. | ||
*[[Specific Process Knowledge/Lithography/Coaters/General SSE spinner process information|General SSE spinner process information]] | |||
*[[Specific Process Knowledge/Lithography/Coaters/SSE Spinner AZ5214e coating|SSE Spinner AZ5214e coating on SSE Spinner]] | *[[Specific Process Knowledge/Lithography/Coaters/SSE Spinner AZ5214e coating|SSE Spinner AZ5214e coating on SSE Spinner]] | ||