Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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= Comparison of switched processes = | = Comparison of switched processes = | ||
{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;" | |||
|- | |||
! rowspan="2" width="100"| Recipe | |||
! rowspan="2" width="20"| Name | |||
! rowspan="2" width="20"| Temp. | |||
! colspan="6" | Deposition step | |||
! colspan="7" | Etch step | |||
! colspan="3" | Comments | |||
|- | |||
! Time | |||
! Pres. | |||
! C<sub>4</sub>F<sub>8</sub> | |||
! SF<sub>6</sub> | |||
! O<sub>2</sub> | |||
! Coil | |||
! Time | |||
! Pres. | |||
! C<sub>4</sub>F<sub>8</sub> | |||
! SF<sub>6</sub> | |||
! O<sub>2</sub> | |||
! Coil | |||
! Platen | |||
! Showerhead | |||
! Runs | |||
! width="100" | Key words | |||
|- | |||
! rowspan="4" | Process A <!-- recipe name --> | |||
! Step1 11 cyc <!-- step --> | |||
| rowspan="2" |20 <!-- chiller temp --> | |||
! 4 <!-- dep time --> | |||
| 25 <!-- dep pressure --> | |||
| 200 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 2000 <!-- coil power --> | |||
| 7.0 <!-- etch time --> | |||
| 25(1.5s) 90>>150 <!-- etch pressure --> | |||
| 0 <!-- C4F8 flow --> | |||
| 350(1.5s) 550 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 2800 <!-- coil power --> | |||
| 120>>140(1.5s) 45 <!-- platen power --> | |||
! rowspan="2" | Old <!-- Showerhead --> | |||
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]] <!-- link processes --> | |||
| rowspan="2" | <!-- keywords --> | |||
|- | |||
! Step2 44 cyc <!-- step --> | |||
! 4 <!-- dep time --> | |||
| 25 <!-- dep pressure --> | |||
| 200 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 2000 <!-- coil power --> | |||
| 7.0 <!-- etch time --> | |||
| 25(1.5s) 150 <!-- etch pressure --> | |||
| 0 <!-- C4F8 flow --> | |||
| 350(1.5s) 550 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 2800 <!-- coil power --> | |||
| 140(1.5s) 45 <!-- platen power --> | |||
|- | |||
! Step1 11 cyc <!-- step --> | |||
| rowspan="2" |20 <!-- chiller temp --> | |||
! 4 <!-- dep time --> | |||
| 25 <!-- dep pressure --> | |||
| 200 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 2000 <!-- coil power --> | |||
| 7.0 <!-- etch time --> | |||
| 25(1.5s) 90>>150 <!-- etch pressure --> | |||
| 0 <!-- C4F8 flow --> | |||
| 350(1.5s) 550 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 2800 <!-- coil power --> | |||
| 120>>140(1.5s) 45 <!-- platen power --> | |||
! rowspan="2" | New <!-- Showerhead --> | |||
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]] <!-- link processes --> | |||
| rowspan="2" | Profile improved <!-- keywords --> | |||
|- | |||
! Step2 44 cyc <!-- step --> | |||
! 4 <!-- dep time --> | |||
| 25 <!-- dep pressure --> | |||
| 200 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 2000 <!-- coil power --> | |||
| 7.0 <!-- etch time --> | |||
| 25(1.5s) 150 <!-- etch pressure --> | |||
| 0 <!-- C4F8 flow --> | |||
| 350(1.5s) 550 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 2800 <!-- coil power --> | |||
| 140(1.5s) 45 <!-- platen power --> | |||
|- | |||
|} | |||
{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;" | {| border="1" cellpadding="1" cellspacing="0" style="text-align:center;" | ||