Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
| Line 79: | Line 79: | ||
! width="100" | Key words | ! width="100" | Key words | ||
|- | |- | ||
! rowspan=" | ! rowspan="7" | Polysilicon etch <!-- recipe name --> | ||
! Original <!-- step --> | ! Original <!-- step --> | ||
| 30 <!-- chiller temp --> | | 30 <!-- chiller temp --> | ||
! 2.3 <!-- dep time --> | ! 2.3 <!-- dep time --> | ||
| 10 <!-- dep pressure --> | |||
| 50 <!-- C4F8 flow --> | |||
| 0 <!-- SF6 flow --> | |||
| 0 <!-- O2 flow --> | |||
| 600 <!-- coil power --> | |||
| 5.0 <!-- etch time --> | |||
| 10 <!-- etch pressure --> | |||
| 20 <!-- C4F8 flow --> | |||
| 60 <!-- SF6 flow --> | |||
| 5 <!-- O2 flow --> | |||
| 400 <!-- coil power --> | |||
| 40 <!-- platen power --> | |||
| Old <!-- Showerhead --> | |||
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]] <!-- link processes --> | |||
| <!-- keywords --> | |||
|- | |||
| Original <!-- step --> | |||
| 30 <!-- chiller temp --> | |||
| 2.3 <!-- dep time --> | |||
| 10 <!-- dep pressure --> | | 10 <!-- dep pressure --> | ||
| 50 <!-- C4F8 flow --> | | 50 <!-- C4F8 flow --> | ||