Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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| S004592
| S004592
| Wafer centre
| Wafer centre
| [[file:S004592 centre.jpg |150px|frameless ]]
| [[file:S004592 centre.jpg |250px|frameless ]]
| S004679
| S004679
| Wafer centre
| Wafer centre
| [[file:S004679 centre.jpg |150px|frameless ]]
| [[file:S004679 centre.jpg |250px|frameless ]]
|-
|-
| S004592
| S004592
| Wafer edge
| Wafer edge
| [[file:S004592 edge.jpg |150px|frameless ]]
| [[file:S004592 edge.jpg |250px|frameless ]]
| S004679
| S004679
| Wafer edge
| Wafer edge
| [[file:S004679 edge.jpg |150px|frameless ]]
| [[file:S004679 edge.jpg |250px|frameless ]]
|-
|-
|}
|}

Revision as of 10:08, 4 December 2014

Comparison of processes before and after the change of showerhead in December 2014
Process Before After
Wafer ID Comment SEM images Wafer ID Comment SEM images
rebe g4-14 black silicon recipe S004592 Wafer centre S004679 Wafer centre
S004592 Wafer edge S004679 Wafer edge