Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

From LabAdviser
Jmli (talk | contribs)
No edit summary
Jmli (talk | contribs)
No edit summary
Line 1: Line 1:
{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
{| border="1" cellpadding="1" cellspacing="1" style="text-align:center;"
|+ '''Process parameters'''
|+ '''Comparison of processes before and after the change of showerhead in December 2014'''
|-
|-
! rowspan="2"| Process
! rowspan="2"| Process
Line 9: Line 9:
! Wafer ID
! Wafer ID
! SEM images
! SEM images
! Parameter change
! Comment
! Wafer ID
! Wafer ID
! SEM images
! SEM images
|-
|-
! rowspan="2"| rebe g4-14 black silicon recipe
| S004592
| Centre wafer
| [[file:S004592 centre.jpg |150px|frameless ]]
| S004592
| Centre wafer
| [[file:S004 centre.jpg |150px|frameless ]]
|}
|}

Revision as of 10:01, 4 December 2014

Comparison of processes before and after the change of showerhead in December 2014
Process Before After
Parameter change Wafer ID SEM images Comment Wafer ID SEM images
rebe g4-14 black silicon recipe S004592 Centre wafer S004592 Centre wafer File:S004 centre.jpg