Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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'''Please note that manual alignment (using the SEM) is no longer allowed.''' You should use semi-automatic alignment only. In rare cases where semi-automatic alignment is impossible, you should remove the resist around the wafer marks before loading the wafer/chip into the machine. | '''Please note that manual alignment (using the SEM) is no longer allowed.''' You should use semi-automatic alignment only. In rare cases where semi-automatic alignment is impossible, you should remove the resist around the wafer marks before loading the wafer/chip into the machine. | ||
[[Image:Chip example.png|right|200px]] | |||
[[Image:P Q marks and chip marks.png|right|250px]] | [[Image:P Q marks and chip marks.png|right|250px]] | ||