Specific Process Knowledge/Characterization/Topographic measurement: Difference between revisions
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!Dektak | !Dektak | ||
!Nanoman | !Nanoman | ||
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|General description | |'''General description''' | ||
|Profiler for measuring micro structures | |Profiler for measuring micro structures | ||
|Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | |Profiler for measuring micro structures. Can do wafer mapping and stress measurements. | ||
|AFM for measuring nanostructures and surface roughness | |AFM for measuring nanostructures and surface roughness | ||
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|Substrate size | |'''Substrate size''' | ||
|small pieces -> 4" | |small pieces -> 4" | ||
|2" -> 8" | |2" -> 8" | ||
|6" or less | |6" or less | ||
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|Max. scan range xy | |'''Max. scan range xy''' | ||
|Line scan x: Full substrate size | |Line scan x: Full substrate size | ||
|Line scan x: 50µm to 200mm | |Line scan x: 50µm to 200mm | ||
|90 µm square | |90 µm square | ||
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|Max. scan range z | |'''Max. scan range z''' | ||
|<100Å to~0.3mm | |<100Å to~0.3mm | ||
|50Å to 262µm | |50Å to 262µm | ||
|1 µm (can go up to 5 µm under special settings) | |1 µm (can go up to 5 µm under special settings) | ||
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|Resolution xy | |'''Resolution xy''' | ||
|up to 5900 data points per profile | |up to 5900 data points per profile | ||
|down to 0.067 µm | |down to 0.067 µm | ||
|Depending on scan size and number of samples per line and number of lines - accuracy better than 2% | |Depending on scan size and number of samples per line and number of lines - accuracy better than 2% | ||
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|Resolution z | |'''Resolution z''' | ||
|1Å or 25Å | |1Å or 25Å | ||
|1Å, 10Å or 20Å | |1Å, 10Å or 20Å | ||
|<1Å - accuracy better than 2% | |<1Å - accuracy better than 2% | ||
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|Max. scan depth [µm] (as a function of trench width W) | |'''Max. scan depth [µm] (as a function of trench width W''') | ||
|0.87(W[µm]-5µm) | |0.87(W[µm]-5µm) | ||
|1.2(W[µm]-5µm) | |1.2(W[µm]-5µm) | ||
|~1 with standard cantilever. | |~1 with standard cantilever. | ||
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|Tip radius | |'''Tip radius''' | ||
|5 µm 60<sup>o</sup> cone | |5 µm 60<sup>o</sup> cone | ||
|5 µm 45<sup>o</sup> cone | |5 µm 45<sup>o</sup> cone | ||
|<12 nm on standard cantilever | |<12 nm on standard cantilever | ||
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|Stress measurement | |'''Stress measurement''' | ||
|Can be done | |Can be done | ||
|Can be done | |Can be done | ||
|Cannot be done | |Cannot be done | ||
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|Surface roughness | |'''Surface roughness''' | ||
|Can be done on a line scan | |Can be done on a line scan | ||
|Can be done on a line scan | |Can be done on a line scan | ||