Specific Process Knowledge/Lithography/Baking: Difference between revisions
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==Oven: 110C - 250C== | ==Oven: 110C - 250C== | ||
[[Image:Oven120C-250C in C-1.jpg|300x300px|thumb|Oven: | [[Image:Oven120C-250C in C-1.jpg|300x300px|thumb|Oven: 110C - 250C situated in C-1]] | ||
Variable temperature convection oven mostly used for baking of wafers as a hard baking step after development of photoresist. | Variable temperature convection oven mostly used for baking of wafers as a hard baking step after development of photoresist. | ||