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Specific Process Knowledge/Wafer and sample drying: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
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|-style="background:lightgray; color:black"
|-style="background:lightgray; color:black"
!Equipment  
!Equipment  
![[Specific_Process_Knowledge/Lithography/Baking#Hotplate:_90-110C|Hotplate: 90-110C]]
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Spin dryer 1]]
|<b>Spin dryer 1</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Spin dryer 2]]
|<b>Spin dryer 2</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Spin dryer 3]]
|<b>Spin dryer 3</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Spin dryer 4]]
|<b>Spin dryer 4</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Single Wafer Spin dryer 1]]
|<b>Single Wafer Spin dryer 1</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Single Wafer Spin dryer 2]]
|<b>Single Wafer Spin dryer 2</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Single Wafer Spin dryer 3]]
|<b>Single Wafer Spin dryer 3</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Critical point dryer]]
|<b>Critical point dryer</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|Ethanol fume dryer]]
|<b>Ethanol fume dryer</b>
|[[Specific_Process_Knowledge/#Wafer_and_sample_drying|N<sub>2</sub> guns]]
|<b>N<sub>2</sub> guns</b>
|-
|-


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