Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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Photoresist (1.5 µm AZ5214E) | Photoresist (1.5 µm AZ5214E) | ||
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!Etch rate | |||
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~40-100 nm/min | ~40-100 nm/min | ||
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1-25 wafer at a time | 1-25 wafer at a time | ||
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!Size of substrate | |||
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4" wafers | 4" wafers | ||