Clean your sample
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Dry your sample
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Create a thin film on your sample
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Dope your sample
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Thermal treatment of your sample
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Make a mask on your sample
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Transfer pattern to your sample
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Define your structure directly File:Jehandefine.jpg
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Bond your samples together
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Characterize your sample
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Pack your sample
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| Clean your sample Clean your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Wafer cleaning
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Soap Sonic
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Removes dust and particles
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| 7-up & Piranha
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Removes traces of organics and alkali ions
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| RCA
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Two step process to remove traces of organics and metals
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| 5% HF
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Removes native oxide
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| IMEC
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Removing dust, traces of organics and alkali ions and slightly polish the surface.
Make the surface hydrophillic
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| Dry your sample Dry your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Wafer and sample drying
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Spin dryers
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Whole wafers
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Critial point dryer
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Sensitive wafers
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Ethanol fume drying
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Sensitive wafers
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N2 blow drying
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N2 pistols
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| Create a layer/film on your sample Create a layer/film on your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Thermal Process/Oxidation
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Thermal oxidation
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Thermal SiO2
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| Thin film deposition
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Sputter deposition
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Metals: Ti, Cu, Al, Cr, Ag, Au, Pd, Ta, Cu, Ta, W, Mo, Co, Fe, Pt, Mg, Nb, Ni, Ru
Semiconductors: Si, Ge
Oxides: SiO2, ITO, ZnO, Al2O3, Cr2O3, MgO, Ta2O3
Alloys: NiV, MnIr, NiFe, AlCu, CoFe, CuTi, FeMn, NiCo, TiW
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Thermal evaporation
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Al, Ge, Ag
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E-beam evaporation
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Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Pd, Ag, Cu, W, Ta
Semiconductors: Si, Ge
Oxides: SiO2, TiOs
Alloys: NiCr, TiAl
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LPCVD
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Si3N4, SRN, SiO2, Si (poly and amorph)
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PECVD
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Si3N4, SiO2, PBSG
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Electroplating
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Ni
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Epitaxial growth /MOCVD
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?
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| Lithography/Coaters
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Spin coating
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resists, polymers
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Spray coating
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resists, polymers
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| Make a mask on your sample Make a mask on your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Lithography
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Photolithography
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UV resists
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Deep UV lithography
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DUV resists
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E-beam lithography
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E-beam resists
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Imprinting
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Polymers
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| Transfer mask pattern to your sample Transfer mask pattern to your sample
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| Entry page in LabAdviser
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Techniques
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Materials
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| Etch
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Wet etch
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Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs
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Dry etch
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Any material
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| Lithography/Lift-off
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Lift-off
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Most materials
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Define your structure directly
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| Entry page in LabAdviser
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Techniques
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Materials
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| Direct Structure Definition
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Polymer Injection molding
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TOPAS
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LASER micro machining
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Silicon, Metal, Graphene (on silicon), Glass (Pyrex, fused silica), TOPAS, PMMA
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Dicing saw
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Silicon, Glass (Pyrex, fused silica)
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| Imprinting
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Imprinting
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TOPAS, PMMA
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| Lithography
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Lithographic definition
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SU8, AZ resists
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| Characterize your sample Characterize your sample
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| Entry page in LabAdviser
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What do you need to measure?
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Technique/Method
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| Characterization
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Sample Imaging, XY dimensions
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Microscopy: optical, SEM, AFM
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Sample Topography
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AFM, Profiling with stylus or optical
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Film thickness and optical constants
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Ellipsometry, Reflectometry, Prism Coupling
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Film Stress
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Profiling with stylus or optical
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Wafer thickness
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Micrometer gauge
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Element analysis
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XPS, EDX, SIMS
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Contact Angle
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Resistivity
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Four point probe, Probe station
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Doping level/Carrier density
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ECV (Electrochemical Capacitance-Voltage) -profiler
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Direct Bandgap
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Photoluminescence
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Lattice mismatch
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X-ray diffractometer
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Defects/contamination
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Particle/defect counter
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