Specific Process Knowledge/Lithography/Baking: Difference between revisions
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== | ==Fume hood hotplates== | ||
Variable temperature hotplate mostly used for baking of single wafers as a soft baking step after a spin coating of photoresist. | Variable temperature hotplate mostly used for baking of single wafers as a soft baking step after a spin coating of photoresist. | ||
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<gallery caption="Fumehood hotplates" widths="220px" heights="225px" perrow="5"> | <gallery caption="Fumehood hotplates" widths="220px" heights="225px" perrow="5"> | ||
image:FumehoodHotplate in C-1.jpg| | image:FumehoodHotplate in C-1.jpg|Fume hood hotplate for [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_.28Polymers.29|Manual Spinner (Polymers)]] located in the fume hood in C-1. | ||
image:FumehoodHotplate in E-5.jpg| | image:FumehoodHotplate in E-5.jpg|Fume hood hotplate for [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_1|Manual Spinner 1]] located in the fume hood in E-5. | ||
image:KOH3 RR4 1.JPG| | image:KOH3 RR4 1.JPG|Fume hood hotplate (Si) for [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin coater: Manual Labspin]] located in the fume hood in A-5. | ||
image:Stinkskab RR2.jpg| | image:Stinkskab RR2.jpg|Fume hood hotplate (III-V) for [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin coater: Manual Labspin]] located in the fume hood in A-5. | ||
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