Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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@@ Line 462: / Line 462: @@
 <br clear="all" />
-==Manual Spinner 1==
+==Manual Spinner (Polymers)==
-[[Image:IMG 1175.JPG|300x300px|thumb|right|The Manual Spinner 1: positioned in fumehood in E-5]]
+[[Image:IMG 1179.JPG|300x300px|thumb|right|The Manual Spinner (Polymers): positioned in fumehood in C-1]]
-'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_1 click here]'''
+'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_(Polymers) click here]'''
-Manual Spinner 1, WS-650 model, from Laurell is a resist spinning coater at Danchip which can be used for spinning on whole 2", 4" and 6" substrates and also a small pieces.
+Manual Spinner (Polymers), OPTIcoat SB20+, from ATMSSE is a resist spinning coater at Danchip which is dedicated for single wafers spinning of e-beam resist, the hot embossing/UV imprint polymers and SU8 resit mixed with color/nano particals.
-The system can be used for spinning all resists, but remember to clean the spinner with an appropriate solvents, which can remove the resist residues.
+All polymers must be validated manually during the use. On this spinner you can spin whole 2", 4" and 6" substrates and also a small pieces.
-'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]'''
+'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=251 LabManager]'''
 <br clear="all" />
@@ Line 484: / Line 485: @@
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black"|
-*Spin coating all resists
+*Spin coating of hot embossing polymers
+*Spin coating of UV imprinting polymers
+*Spin coating of e-beam resists
+*Spin coating of SU8 resists mixed with color/nano particles
 |-
 !style="background:silver; color:black;" align="center" width="60"|Resist
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black" align="center"|
-* all approved resists
+* PMMA
+* Topas
+* e-beam resits
+* SU8 resists mixed with color/nano particles
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance
@@ Line 519: / Line 526: @@
 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black" align="center" colspan="2"|
-All cleanroom materials
+All cleanroom materials except III-V materials
 |-
 |style="background:LightGrey; color:black"|Batch
@@ Line 529: / Line 536: @@
 <br clear="all" />
-==Manual Spinner (Polymers)==
+==Manual Spinner 1==
+[[Image:IMG 1175.JPG|300x300px|thumb|right|The Manual Spinner 1: positioned in fumehood in E-5]]
-[[Image:IMG 1179.JPG|300x300px|thumb|right|The Manual Spinner (Polymers): positioned in fumehood in C-1]]
+'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_1 click here]'''
-'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_(Polymers) click here]'''
+Manual Spinner 1, WS-650 model, from Laurell is a resist spinning coater at Danchip which can be used for spinning on whole 2", 4" and 6" substrates and also a small pieces.
-Manual Spinner (Polymers), OPTIcoat SB20+, from ATMSSE is a resist spinning coater at Danchip which is dedicated for single wafers spinning of e-beam resist, the hot embossing/UV imprint polymers and SU8 resit mixed with color/nano particals.
+The system can be used for spinning all resists, but remember to clean the spinner with an appropriate solvents, which can remove the resist residues.
-All polymers must be validated manually during the use. On this spinner you can spin whole 2", 4" and 6" substrates and also a small pieces.
+'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=315 LabManager]'''
-'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=251 LabManager]'''
 <br clear="all" />
@@ Line 552: / Line 558: @@
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black"|
-*Spin coating of hot embossing polymers
+*Spin coating all resists
-*Spin coating of UV imprinting polymers
-*Spin coating of e-beam resists
-*Spin coating of SU8 resists mixed with color/nano particles
 |-
 !style="background:silver; color:black;" align="center" width="60"|Resist
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black" align="center"|
-* PMMA
+* all approved resists
-* Topas
-* e-beam resits
-* SU8 resists mixed with color/nano particles
 |-
 !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance
@@ Line 593: / Line 593: @@
 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black" align="center" colspan="2"|
-All cleanroom materials except III-V materials
+All cleanroom materials
 |-
 |style="background:LightGrey; color:black"|Batch