Specific Process Knowledge/Lithography/Baking: Difference between revisions
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==Oven: 120C - 250C== | |||
'''The user manual, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=169 Oven: 120C - 250C]''' | |||
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==Oven 250C for pretreatment== | ==Oven 250C for pretreatment== | ||
[[Image:Oven_250_degrees_for_pretreatment_cr3.jpg|300x300px|thumb|Oven 250C for pretreatment: positioned in C-1]] | [[Image:Oven_250_degrees_for_pretreatment_cr3.jpg|300x300px|thumb|Oven 250C for pretreatment: positioned in C-1]] | ||
[[Specific_Process_Knowledge/Lithography/Pretreatment#Oven_250C|Oven 250C]] | [[Specific_Process_Knowledge/Lithography/Pretreatment#Oven_250C|Oven 250C]] | ||
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