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| ==250 C oven for pretreatment== | | ==250 C oven for pretreatment== |
| [[Image:Oven_250_degrees__for_pretreatment_cr3.jpg|300x300px|thumb|Oven 250 °C for pretreatment: positioned in C-1]] | | [[Specific Process Knowledge/Lithography/UVLithography|UV Lithography]] |
| The oven is typically used for pretreatment of silicon and glass substrates to promote the resist adhesion. We recommend to place the wafers in metal carrier in the oven at least for 4 hours, even better over night, and spin the resist on them asap.
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| '''The user manual, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=117 Oven 250C]'''
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| ==250 C oven for burning resist== | | ==250 C oven for burning resist== |
