Specific Process Knowledge/Wafer and sample drying

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Drying Comparison Table

Equipment		Spin dryer 1	Spin dryer 2	Spin dryer 3	Spin dryer 4	Critical point dryer	Ethanol fume dryer	N2 guns
Location		C-1	B-1	D-3	E-5	D-3	C-1	In fumehoods and at chemical benches
Purpose		Drying	Drying	Drying	Drying Rinsing + drying	Drying sensitive samples. E.g. with cantilevers	Drying sensitive samples. E.g. with cantilevers	Drying all kind of samples.
Substrates	Batch size	1-25 100 mm wafers	1-25 100 mm wafers	1-25 100 mm wafers 1-25 150 mm wafers	? 50 mm wafers 1-25 100 mm wafers 1-25 150 mm wafers	1 to 5 wafers per run. Sizes: 2”, 4" or 6" Pieces (up to 10x10mm)	1-25 50 mm wafers 1-25 100 mm wafers Pieces if a suitable carrier is available	One sample at a time
	Allowed materials	No restrictions	Only for RCA cleaned wafers	No restrictions	No restrictions	Si,SiO2, Si3N4 Quartz and Pyrex InAlP, GaAs SU8	No restriction except for polymers	No restriction

Choose a drying equipment

• Critical Point Dryer
• Spin Dryers