Specific Process Knowledge/Wafer and sample drying: Difference between revisions
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|style="background:WhiteSmoke; color:black"|<b>Spin dryer 4</b> | |style="background:WhiteSmoke; color:black"|<b>Spin dryer 4</b> | ||
|style="background:WhiteSmoke; color:black"|<b>Critical point dryer</b> | |style="background:WhiteSmoke; color:black"|<b>Critical point dryer</b> | ||
|style="background:WhiteSmoke; color:black"|<b>Ethanol | |style="background:WhiteSmoke; color:black"|<b>Ethanol fume dryer</b> | ||
|style="background:WhiteSmoke; color:black"|<b>N<sub>2\sub guns</b> | |||
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!style="background:silver; color:black;" align="center" width="60"|Location | !style="background:silver; color:black;" align="center" width="60"|Location |
Revision as of 15:39, 31 October 2014
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Drying Comparison Table
Equipment | Spin dryer 1 | Spin dryer 2 | Spin dryer 3 | Spin dryer 4 | Critical point dryer | Ethanol fume dryer | N2\sub guns | |
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Allowed materials |
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