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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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Development: SP 60s
Development: SP 60s
*'''AZ 5214E'''
*'''AZ 5214E''' (positive process)
Exposure dose: 8.5s @ 7 mW/cm2 (1.5 µm)
Exposure dose: 8.5s @ 7 mW/cm2 (1.5 µm)


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