Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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* All software options available | * All software options available | ||
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* Antivibration platform | |||
* Fjeld M-200 airlock taking up to 8" wafers | * Fjeld M-200 airlock taking up to 8" wafers | ||
* Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package | * Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package | ||