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Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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Jmli (talk | contribs)
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* 20 nm (limited by instrument)
* 20 nm (limited by instrument)
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!style="background:silver; color:black" align="center" valign="center" rowspan="4"|Instrument specifics
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
|style="background:LightGrey; color:black"|Detectors
|style="background:LightGrey; color:black"|Detectors
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* Secondary electron (Se2)
* Secondary electron (Se2)
* Inlens secondary electron (Inlens)
* Inlens secondary electron (Inlens)
* Backscatter electron (QBSD)
* Backscatter electron (BSD)
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* Secondary electron (Se2)
* Secondary electron (Se2)
* Inlens secondary electron (Inlens)
* Inlens secondary electron (Inlens)
* Backscatter electron (QBSD)
* 4 Quadrant Backscatter electron (QBSD) (out of order)
* Variable pressure secondary electron (VPSE)
* Variable pressure secondary electron (VPSE)
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* Secondary electron (Se2)
* Secondary electron (Se2)
* Inlens secondary electron (Inlens)
* Inlens secondary electron (Inlens)
* Backscatter electron (QBSD)
* 4 Quadrant Backscatter electron (QBSD)
* Variable pressure secondary electron (VPSE)
* Variable pressure secondary electron (VPSE)
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* Fixed at High vacuum
* Fixed at High vacuum
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|style="background:LightGrey; color:black"|Options
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* Raith Elphy Quantum E-Beam Litography system
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* All software options available
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* Fjeld M-200 airlock taking up to 8" wafers
* Oxford Instruments X-Max<sup>N</sup> 50 mm<sup>2</sup> SDD EDX detector and AZtec software package
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates