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| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| * Any standard cleanroom material except graphene or CNT samples | | * Any standard cleanroom material except graphene or CNT samples |
| |style="background:WhiteSmoke; color:black"|
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| * Any standard cleanroom material including graphene or CNT samples
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| * Biological samples
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| |-
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| |}
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|
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| ==Equipment performance and process related parameters==
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|
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| {| border="2" cellspacing="0" cellpadding="0"
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
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| |style="background:WhiteSmoke; color:black" align="center"|[[/Leo|SEM Leo]]
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| |style="background:WhiteSmoke; color:black" align="center"|[[/Zeiss|SEM Zeiss]]
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| |style="background:WhiteSmoke; color:black" align="center"|[[/Supra60VP|SEM Supra 60VP]]
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|
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| |style="background:WhiteSmoke; color:black" align="center"|[[/FEI|SEM FEI]]
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| |style="background:WhiteSmoke; color:black" align="center"|[[/Jeol|SEM Jeol]]
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| |-
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Model
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| |style="background:WhiteSmoke; color:black" align="center"| Leo 1550 SEM
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| |style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 40 VP
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| |style="background:WhiteSmoke; color:black" align="center"| Zeiss Supra 60 VP
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| |style="background:WhiteSmoke; color:black" align="center"| FEI Nova 600 NanoSEM
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| |style="background:WhiteSmoke; color:black" align="center"| Jeol JSM 5500 LV
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| |-
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| !style="background:silver; color:black;" align="center" width="60"|Purpose
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| |style="background:LightGrey; color:black"| Imaging and measurement of
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| |style="background:WhiteSmoke; color:black"|
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| * Any (semi)conducting sample that may have thin (> ~ 5 µm) layers of non-conducting materials on top
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| |style="background:WhiteSmoke; color:black"|
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| * Any sample except bulk insulators such as polymers, glass or quartz wafers
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| |style="background:WhiteSmoke; color:black"|
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| * Any sample except bulk insulators such as polymers, glass or quartz wafers
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| |style="background:WhiteSmoke; color:black"|
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| * All samples
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| * Bulk insulators such as polymer-, glass or quartz wafers
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| |style="background:WhiteSmoke; color:black"|
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| * Samples from the 'real' world outside the lab
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Performance
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| |style="background:LightGrey; color:black" rowspan="2"|Resolution
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| |style="background:Whitesmoke; color:black" colspan="5" align="center"| The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples
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| |-
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| |style="background:WhiteSmoke; color:black"|
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| * ~ 5 nanometers (limited by vibrations)
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| |style="background:WhiteSmoke; color:black"|
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| * 1-2 nm (limited by vibrations)
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| |style="background:WhiteSmoke; color:black"|
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| * 1-2 nm (limited by vibrations)
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| |style="background:WhiteSmoke; color:black"|
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| * 1-2 nm (limited by vibrations)
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| |style="background:WhiteSmoke; color:black"|
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| * 20 nm (limited by instrument)
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="4"|Instrument specifics
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| |style="background:LightGrey; color:black"|Detectors
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| |style="background:WhiteSmoke; color:black"|
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| * Secondary electron (Se2)
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| * Inlens secondary electron (Inlens)
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| * Backscatter electron (QBSD)
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| |style="background:WhiteSmoke; color:black"|
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| * Secondary electron (Se2)
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| * Inlens secondary electron (Inlens)
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| * Backscatter electron (QBSD)
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| * Variable pressure secondary electron (VPSE)
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| |style="background:WhiteSmoke; color:black"|
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| * Secondary electron (Se2)
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| * Inlens secondary electron (Inlens)
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| * Backscatter electron (QBSD)
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| * Variable pressure secondary electron (VPSE)
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| |style="background:WhiteSmoke; color:black"|
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| * Secondary electron (ETD)
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| * Inlens secondary electron (TLD)
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| * Backscatter electron (BSD)
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| * Variable pressure secondary electron (LVD)
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| * High resolution varable pressure secondary (Helix)
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| |style="background:WhiteSmoke; color:black"|
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| * Secondary electron (SEI)
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| * Backscatter electron (BEI)
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| |-
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| |style="background:LightGrey; color:black"|Stage
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| |style="background:WhiteSmoke; color:black"|
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| * X, Y: 125 × 100 mm
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| * T: 0 to 90<sup>o</sup>
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| * R: 360<sup>o</sup>
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| * Z: 48 mm
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| |style="background:WhiteSmoke; color:black"|
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| * X, Y: 130 × 130 mm
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| * T: -4 to 70<sup>o</sup>
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| * R: 360<sup>o</sup>
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| * Z: 50 mm
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| |style="background:WhiteSmoke; color:black"|
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| * X, Y: 150 × 150 mm
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| * T: -10 to 70<sup>o</sup>
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| * R: 360<sup>o</sup>
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| * Z: XXX mm
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| |style="background:WhiteSmoke; color:black"|
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| * X, Y: 150 × 150 mm
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| * T: -10 to 60<sup>o</sup>
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| * R: 360<sup>o</sup>
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| * Z: 10 mm
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| |style="background:WhiteSmoke; color:black"|
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| * X, Y: 73 × 40 mm
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| * T: -10 to 90<sup>o</sup>
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| * R: 360<sup>o</sup>
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| * Z: 38 mm
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| |-
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| |style="background:LightGrey; color:black"|Electron source
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| |style="background:WhiteSmoke; color:black"|
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| * FEG (Field Emission Gun) source
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| |style="background:WhiteSmoke; color:black"|
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| * FEG (Field Emission Gun) source
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| |style="background:WhiteSmoke; color:black"|
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| * FEG (Field Emission Gun) source
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| |style="background:WhiteSmoke; color:black"|
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| * FEG (Field Emission Gun) source
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| |style="background:WhiteSmoke; color:black"|
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| * Tungsten filament
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| |-
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| |style="background:LightGrey; color:black"|Operating pressures
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| |style="background:WhiteSmoke; color:black"|
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| * Fixed at High vacuum (2 × 10<sup>-5</sup>mbar - 10<sup>-6</sup>mbar)
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| |style="background:WhiteSmoke; color:black"|
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| * Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
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| * Variable at Low vacuum (0.1 mbar-2 mbar)
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| |style="background:WhiteSmoke; color:black"|
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| * Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
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| * Variable at Low vacuum (0.1 mbar-2 mbar)
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| |style="background:WhiteSmoke; color:black"|
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| * Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
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| * Variable at Low vacuum (0.1 mbar-2 mbar)
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| |style="background:WhiteSmoke; color:black"|
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| * Fixed at High vacuum
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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| |style="background:LightGrey; color:black"|Sample sizes
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| |style="background:WhiteSmoke; color:black"|
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| * Wafers up to 6" (only full view up to 4")
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| |style="background:WhiteSmoke; color:black"|
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| * Up to 6" wafer with full view
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| |style="background:WhiteSmoke; color:black"|
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| * Up to 8" wafer with 6" view
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| |style="background:WhiteSmoke; color:black"|
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| * Up to 6" wafer with full view
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| * A 12" wafer holder has been made but it requires special training
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| |style="background:WhiteSmoke; color:black"|
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| * Up to 4" wafer
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| |-
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| | style="background:LightGrey; color:black"|Allowed materials
| |
| |style="background:WhiteSmoke; color:black"|
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| * Any standard cleanroom material except graphene or CNT samples
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * Any standard cleanroom material except graphene or CNT samples
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * Any standard cleanroom material except graphene or CNT samples
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * Any standard cleanroom material including graphene or CNT samples
| |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| * Any standard cleanroom material including graphene or CNT samples | | * Any standard cleanroom material including graphene or CNT samples |
