Specific Process Knowledge/Etch/ICP Metal Etcher/Aluminium: Difference between revisions
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|~350 nm/min (depending on features size and etch load) | |~350 nm/min (depending on features size and etch load) | ||
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{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | |||
|+ '''Al etch''' ''made by Chantal Silvetre@danchip October 2014'' | |||
|- | |||
! rowspan="2" | Parameter | |||
! colspan="2" | Process step | |||
|- | |||
! width="200" | Breakthrough | |||
! width="200" | Main | |||
|- | |||
! Time (secs) | |||
| 20 | |||
| 40 (variable) | |||
|- | |||
! HBr (sccm) | |||
| - | |||
| 15 | |||
|- | |||
! Cl<sub>2</sub> (sccm) | |||
| 20 | |||
| 25 | |||
|- | |||
! Pressure (mTorr) | |||
| 2, Strike 3 secs @ 15 mTorr??? | |||
| 1 | |||
|- | |||
! Coil power (W) | |||
| 600 | |||
| 500 | |||
|- | |||
! Platen power (W) | |||
| 125 | |||
| 100 | |||
|- | |||
! Temperature (<sup>o</sup>C) | |||
| 20 | |||
| 20 | |||
|- | |||
! Spacers (mm) | |||
| 100 | |||
| 100 | |||
|- | |||
!Results | |||
| | |||
| | |||
|- | |||
!Etch rate | |||
| | |||
|~282 nm/min (depending on features size and etch load) | |||
|} | |} | ||