Specific Process Knowledge/Thin film deposition/Deposition of Titanium: Difference between revisions
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! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]]) | ! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/Physimeca|Physimeca]]) | ||
! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ! Sputter deposition ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ||
! E-beam evaporation ([[Specific Process Knowledge/Thin film deposition/III-V Dielectric evaporator|III-V Dielectric evaporator]]) | |||
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|E-beam deposition of Titanium | |E-beam deposition of Titanium | ||
|Sputter deposition of Titanium | |Sputter deposition of Titanium | ||
|E-beam deposition of Titanium | |||
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|RF Ar clean | |RF Ar clean | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
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|10Å to 1000Å | |10Å to 1000Å | ||
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|10Å to 1000Å | |||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
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|About 10Å/s | |About 10Å/s | ||
|Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]]. | |Depending on process parameters, see [[Sputtering of Ti in Wordentec|here]]. | ||
|About 1Å/s | |||
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*6x4" wafers or | *6x4" wafers or | ||
*6x6" wafers | *6x6" wafers | ||
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* 2" wafer or | |||
* Smaller pieces | |||
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* III-V materials | * III-V materials | ||
* Silicon wafers | |||
* Quartz wafers | |||
* Pyrex wafers | |||
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* Silicon wafers | * Silicon wafers | ||
* Quartz wafers | * Quartz wafers | ||
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* SU-8 | * SU-8 | ||
* Metals | * Metals | ||
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* Silicon oxide | |||
* Silicon (oxy)nitride | |||
* Photoresist | |||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
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|Only very thin layers (up to 100nm). | |Only very thin layers (up to 100nm). | ||
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