Specific Process Knowledge: Difference between revisions
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[[Specific Process Knowledge/Lithography/Baking| Lithography/Baking]] | [[Specific Process Knowledge/Lithography/Baking| Lithography/Baking]] <br> | ||
[[Specific Process Knowledge/Lithography/Pretreatment#Oven_250C|Lithography/Pretreatment#Oven_250C]] | |||
|Baking (<300dg) | |Baking (<300dg) | ||
|baking resist and polymers, wafer removal | |baking resist and polymers, wafer removal | ||