Specific Process Knowledge/Characterization/Element analysis: Difference between revisions
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[[image:SIMScascade.gif|200x200px|right|thumb|A beam of high energy ions is rastered on the surface of the sample. Some of the atoms that used to make up the surface are sputtered off and emitted as secondary ions. The mass of the these ions is measured with a mass spectrometer.]] | [[image:SIMScascade.gif|200x200px|right|thumb|A beam of high energy ions is rastered on the surface of the sample. Some of the atoms that used to make up the surface are sputtered off and emitted as secondary ions. The mass of the these ions is measured with a mass spectrometer.]] | ||
In the Atomika SIMS the samples are bombarded with a beam of either oxygen or caesium ions. | In the Atomika SIMS the samples are bombarded with a beam of either oxygen or caesium ions. When accelerated to high energy and rastered across the sample | ||
these ions will be able to gradually sputter off the surface atoms in a small area. In this way one layer after another is peeled off the sample. Some of the surface atoms are emitted as ionized particles. | these ions will be able to gradually sputter off the surface atoms in a small area. In this way one layer after another is peeled off the sample. Some of the surface atoms are emitted as ionized particles. | ||