Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions
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==Rinse== | ==Rinse== | ||
After development, the substrate is rinsed using DI water, and dried using nitrogen. | |||
The standard rinse and dry procedure is 30s at 4000rpm with DIW being administered from the top at the center of the substrate, followed by a 10-15s dry using nitrogen from the top at the center of the substrate. The top side rinse is at a rate of approximately 500 ml/min, corresponding to 250 ml DIW during the rinse. The flow rate of the nitrogen is 50 l/min, and the drying time is set according to the size of the substrate. | |||
==Post-exposure baking== | ==Post-exposure baking== | ||