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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 68: Line 68:


''Flow names and process parameters:''
''Flow names and process parameters:''
*'''T1 MiR 701 1um no HMDS'''
*'''DCH 100mm PEB60s@110C+SP60s'''
*'''T1 MiR 701 1um with HMDS'''
A combination of the 'DCH PEB 110C 60s' post-exposure bake and the 'DCH 100mm SP 60s' development.
Spin-off: 60 s at 9990 rpm.
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