Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions
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'''Anneal:''' Same as process temperature for 20 minutes with N<sub>2</sub>: 6 SLM | '''Anneal:''' Same as process temperature for 20 minutes with N<sub>2</sub>: 6 SLM | ||
'''Test Wafers:''' N-Type <100> No RCA Clean | '''Test Wafers:''' 4 inch Silicon wafers, N-Type <100> No RCA Clean | ||
====Results (2)==== | ====Results (2)==== | ||