Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions
| Line 35: | Line 35: | ||
'''Anneal:''' Same as process temperature for 20 minutes with N<sub>2</sub>: 6 SLM | '''Anneal:''' Same as process temperature for 20 minutes with N<sub>2</sub>: 6 SLM | ||
'''Test Wafers:''' N-Type <100> No RCA Clean | '''Test Wafers:''' 4 inch silicon wafers, N-Type <100> No RCA Clean | ||
====Results (1)==== | ====Results (1)==== | ||