Specific Process Knowledge/Etch/DryEtchProcessing/OES: Difference between revisions
Created page with "== Optical Endpoint detection systems == During a process, the plasma dissociates the gas molecules present in the process chamber into reactive species that emit light at ce..." |
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; Graphs: | ; Graphs: | ||
: What plots to be displayed. Select <ul> <li> Spectral Graphs: This will show the spectrum (typically from 200 nm to 80 nm) of light during the process.</li> <li> Trend Graphs: Select which equations to be displayed. These graphs will enable you to monitor the development of the Peaks relevant for you as you etch your sample.</li> <li> Sequence, Reprocess and Properties: | : What plots to be displayed. Select <ul> <li> Spectral Graphs: This will show the spectrum (typically from 200 nm to 80 nm) of light during the process.</li> <li> Trend Graphs: Select which equations to be displayed. These graphs will enable you to monitor the development of the Peaks relevant for you as you etch your sample.</li> <li> Sequence, Reprocess and Properties: Advanced options that have not been fully explored yet. </li> </ul> | ||
=== Processing === | === Processing === | ||