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Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
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[[image:Steamer_process_develop_fig3.png|300 × 200 px|middle|The percent different of the silicon dioxide thickness at the steamer flow rate at 10 and 25 l/min variation with temperature.]]
[[image:Steamer_process_develop_fig3.png|520 px|middle|The percent different of the silicon dioxide thickness at the steamer flow rate at 10 and 25 l/min variation with temperature.]]


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====Experimental setup (2)====
====Experimental setup (2)====
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