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Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions

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[[image:Steamer_process_develop_fig4.png|527 × 324 px|middle|Silicon dioxide thickness variation with growth time (from 0 to 720 minutes) in different temperature.]]
[[image:Steamer_process_develop_fig4.png|527px|middle|Silicon dioxide thickness variation with growth time (from 0 to 720 minutes) in different temperature.]]


'''
'''
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