Specific Process Knowledge/Etch/Wet Silicon Nitride Etch: Difference between revisions
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*~4 Å/min (Thermal oxide) | *~4 Å/min (Thermal oxide) | ||
| | | | ||
*~26 Å/min (si-rich Si<sub>3</sub>N<sub>4</sub>) | *~26 Å/min (si-rich Si<sub>3</sub>N<sub>4</sub>) | ||
*~ | *~? Å/min (Thermal oxide) | ||
|- | |- | ||
|Batch size | |Batch size | ||