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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,142 edits
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|style="background:LightGrey; color:black"|Etch rates  
|style="background:LightGrey; color:black"|Etch rates  
See more [[/BHF etch rates|etch rates]]  
[[/BHF etch rates|See more]]  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Wet thermal oxide:75-80nm/min  
*Wet thermal oxide:75-80nm/min  
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