Specific Process Knowledge/Etch/DryEtchProcessing: Difference between revisions
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! style="background:silver; color:black" | [[Specific Process Knowledge/Etch/III-V ICP|III-V ICP]] | ! style="background:silver; color:black" | [[Specific Process Knowledge/Etch/III-V ICP|III-V ICP]] | ||
|- valign="top" | |- valign="top" | ||
! rowspan="2" style="background:silver; color:black" width=" | ! rowspan="2" style="background:silver; color:black" width="120" |Purpose | ||
! style="background:WhiteSmoke; color:black" | Primary uses | ! style="background:WhiteSmoke; color:black" | Primary uses | ||
| style="background:WhiteSmoke; color:black"| The RIE chamber for etching of: | | style="background:WhiteSmoke; color:black"| The RIE chamber for etching of: | ||