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Specific Process Knowledge/Etch/DryEtchProcessing: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
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|- valign="top"
|- valign="top"
! rowspan="2" style="background:silver; color:black" width="60" |Purpose
! rowspan="2" style="background:silver; color:black" width="60" |Purpose
! style="background:WhiteSmoke; color:black" width="60" | Primary uses
! style="background:WhiteSmoke; color:black" width="30" | Primary uses
| style="background:WhiteSmoke; color:black"| The RIE chamber for etching of:
| style="background:WhiteSmoke; color:black"| The RIE chamber for etching of:
* silicon
* silicon
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