Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
| Line 53: | Line 53: | ||
½ dose for broadband exposure. | ½ dose for broadband exposure. | ||
|AZ 351B developer | |[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | ||
or | |||
[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |||
|DI water | |DI water | ||
|Acetone | |Acetone | ||
| Line 73: | Line 77: | ||
½ dose for broadband exposure. | ½ dose for broadband exposure. | ||
|AZ 351B developer | |[[Specific_Process_Knowledge/Lithography/Development#Developer-6inch|AZ 351B developer]] | ||
or | |||
[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | |||
|DI water | |DI water | ||
|Acetone | |Acetone | ||
| Line 91: | Line 99: | ||
1/5 dose for broadband exposure. | 1/5 dose for broadband exposure. | ||
|AZ 726 MIF developer | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
|Remover 1165 | |Remover 1165 | ||
| Line 107: | Line 115: | ||
Same dose for broadband exposure. | Same dose for broadband exposure. | ||
|AZ 726 MIF developer | |[[Specific_Process_Knowledge/Lithography/Development#Developer_TMAH_UV-lithography|AZ 726 MIF developer]] | ||
|DI water | |DI water | ||
|Remover 1165 | |Remover 1165 | ||