Specific Process Knowledge/Characterization: Difference between revisions
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*[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | *[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | ||
*[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | *[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | ||
*[[/Profiler#III V Profiler|III V Profiler]] | |||
*[[/Optical microscope|Optical microscope]] | *[[/Optical microscope|Optical microscope]] | ||
Revision as of 11:27, 18 September 2014
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Choose characterization topic
- Element analysis
- Measurement of film thickness and optical constants
- Photoluminescence mapping
- Sample imaging
- Stress measurement
- Wafer thickness measurement
- Topographic measurement
- Contact angle measurement
- Four-Point_Probe (Resistivity measurement)
- Carrier density (doping) profiler
- Scanning Electron Microscopy